TENSILE PROPERTIES OF ALUMINUM ALUMINA MULTILAYERED THIN-FILMS

被引:57
作者
MEARINI, GT [1 ]
HOFFMAN, RW [1 ]
机构
[1] CASE WESTERN RESERVE UNIV,DEPT PHYS,CLEVELAND,OH 44105
关键词
ALUMINA; ALUMINUM; MECHANICAL PROPERTIES; MULTILAYER; THIN FILMS;
D O I
10.1007/BF02666408
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin, free standing aluminum and alumina films were produced by physical vapor deposition and tensile properties were measured. Young's modulus of the aluminum was microstructure insensitive, but the plastic behavior was very structure sensitive. The natural surface oxide of the aluminum had no apparent affect on the measured value of Young's modulus. The alumina films showed true brittle behavior, but Young's modulus was lower than bulk. Impurities residing at the grain boundaries were observed in the aluminum films using transverse Auger electron spectroscopy (AES). The films were well characterized using AES, transmission electron microscopy, Rutherford backscattering spectroscopy, and secondary electron microscopy. Well characterized, thin three-layered aluminum/alumina compositionally modulated films were produced by alternate depositions and tensile properties were measured. Young's modulus was found to be less than a weighted thickness average of Young's modulus of the individual constituents. Otherwise, the mechanical measurements yielded typical bulk behavior.
引用
收藏
页码:623 / 629
页数:7
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