PREPARATION AND COMPOSITIONAL ANALYSIS OF SPUTTERED TAN FILMS

被引：17

作者：

REICHELT, K

NELLEN, W

MAIR, G

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 10期

关键词：

D O I：

10.1063/1.324428

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5284 / 5287

页数：4

共 12 条

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[2]

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[4] SUPERCONDUCTING THIN FILMS OF NIOBIUM, TANTALUM, TANTALUM NITRIDE, TANTALUM CARBIDE, AND NIOBIUM NITRIDE [J].

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[5] SUPERCONDUCTING TRANSITION-TEMPERATURES OF REACTIVELY SPUTTERED FILMS OF TANTALUM NITRIDE AND TUNGSTEN NITRIDE [J].

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[6]

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[7] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].

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[9] STRUCTURE OF TANTALUM NITRIDES [J].

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[10] ANALYSIS OF SPUTTERING DISCHARGE BY OPTICAL AND MASS-SPECTROMETRY .2. PLATINUM AND TANTALUM SPUTTERED IN ARGON-NITROGEN MIXTURES [J].

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