SUPERCONDUCTING TRANSITION-TEMPERATURES OF REACTIVELY SPUTTERED FILMS OF TANTALUM NITRIDE AND TUNGSTEN NITRIDE

被引：27

作者：

KILBANE, FM ^{[1
]}

HABIG, PS ^{[1
]}

机构：

[1] ARMCO STEEL CORP,RES & TECHNOL,MIDDLETOWN,OH 45043

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568734

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：107 / 109

页数：3

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