TAC COATINGS PREPARED BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION - CHARACTERIZATION AND PROPERTIES

被引：15

作者：

DUA, AK

GEORGE, VC

机构：

[1] Materials Science Section, Chemistry Division, Bhabha Atomic Research Centre, Bombay

来源：

THIN SOLID FILMS | 1994年 / 247卷 / 01期

关键词：

D O I：

10.1016/0040-6090(94)90472-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Hot filament chemical vapour deposition has been used to prepare stable, adherent and stoichiometric tantalum carbide films. The films have been characterized using X-ray diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy and scanning electron microscopy. Their microhardness has been measured and their proton bombardment behaviour studied.

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页码：34 / 38

页数：5

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