ANALYSIS OF INDIUM NITRIDE SURFACE OXIDATION

被引:43
作者
FOLEY, CP [1 ]
LYNGDAL, J [1 ]
机构
[1] TEKTRONIX INC,BEAVERTON,OR 97077
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574558
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1708 / 1712
页数:5
相关论文
共 16 条
[1]   CHARACTERIZATION OF INN, IN2O3, AND IN OXY-NITRIDE SEMICONDUCTING THIN-FILMS USING XPS ELECTRON-ENERGY LOSS SPECTRA [J].
BARR, TL ;
NATARAJAN, BR ;
ELTOUKHY, AH ;
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :517-517
[2]   ASSESSMENT OF THE QUALITY OF ANODIC NATIVE OXIDES OF GAAS FOR MOS DEVICES [J].
BREEZE, PA ;
HARTNAGEL, HL .
THIN SOLID FILMS, 1979, 56 (1-2) :51-61
[3]   APPLICATION OF ELECTRON-SPECTROSCOPY TO SURFACE STUDIES [J].
BRUNDLE, CR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :212-224
[4]   MECHANISMS OF REACTIVE SPUTTERING OF INDIUM .3. A GENERAL PHENOMENOLOGICAL MODEL FOR REACTIVE SPUTTERING [J].
ELTOUKHY, AH ;
NATARAJAN, BR ;
GREENE, JE ;
BARR, TL .
THIN SOLID FILMS, 1980, 69 (02) :229-235
[5]   MORPHOLOGY AND STRUCTURE OF INDIUM NITRIDE FILMS [J].
FOLEY, CP ;
TANSLEY, TL .
APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY) :663-669
[6]   ELECTRONIC RELAXATION PROCESSES IN KLL' AUGER-SPECTRA OF FREE MAGNESIUM ATOM, SOLID MAGNESIUM AND MGO [J].
HOOGEWIJS, R ;
FIERMANS, L ;
VENNIK, J .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1977, 11 (02) :171-183
[7]  
KOYAMA R, COMMUNICATION
[8]   THERMAL STABILITY OF INDIUM NITRIDE AT ELEVATED TEMPERATURES AND NITROGEN PRESSURES [J].
MACCHESNEY, JB ;
BRIDENBAUGH, PM ;
OCONNOR, PB .
MATERIALS RESEARCH BULLETIN, 1970, 5 (09) :783-+
[9]   EFFECT OF SURFACE INDEX AND ATOMIC ORDER ON THE GAAS-OXYGEN INTERACTION [J].
MARK, P ;
CREIGHTON, WF .
THIN SOLID FILMS, 1979, 56 (1-2) :19-38
[10]  
MCCUNE RC, 1981, J VAC SCI TECHNOL, V18, P700, DOI 10.1116/1.570930