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ELECTRON AND HOLE IMPACT IONIZATION COEFFICIENTS IN INP DETERMINED BY PHOTOMULTIPLICATION MEASUREMENTS
被引:152
作者
:
COOK, LW
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
COOK, LW
BULMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
BULMAN, GE
STILLMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
STILLMAN, GE
机构
:
[1]
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
[2]
UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
来源
:
APPLIED PHYSICS LETTERS
|
1982年
/ 40卷
/ 07期
关键词
:
D O I
:
10.1063/1.93190
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:589 / 591
页数:3
相关论文
共 7 条
[1]
[Anonymous], 1977, SEMICONDUCTORS SEMIM
[2]
IONIZATION COEFFICIENTS OF ELECTRONS AND HOLES IN INP
ARMIENTO, CA
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
ARMIENTO, CA
GROVES, SH
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
GROVES, SH
HURWITZ, CE
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
HURWITZ, CE
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(04)
: 333
-
335
[3]
THE EFFECT OF ELECTRO-ABSORPTION ON THE DETERMINATION OF IONIZATION COEFFICIENTS
BULMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
BULMAN, GE
COOK, LW
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
COOK, LW
STILLMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
STILLMAN, GE
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(10)
: 813
-
815
[4]
ELECTRON AND HOLE IONIZATION RATES IN EPITAXIAL SILICON AT HIGH ELECTRIC-FIELDS
GRANT, WN
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS, MURRAY HILL, NJ 07974 USA
BELL TEL LABS, MURRAY HILL, NJ 07974 USA
GRANT, WN
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(10)
: 1189
-
1203
[5]
KAO CW, 1980, SOLID STATE ELECTRON, V23, P881, DOI 10.1016/0038-1101(80)90106-9
[6]
IONIZATION COEFFICIENTS MEASURED IN ABRUPT INP JUNCTIONS
UMEBU, I
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UMEBU, I
CHOUDHURY, ANMM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
CHOUDHURY, ANMM
ROBSON, PN
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
ROBSON, PN
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(04)
: 302
-
303
[7]
USE OF A SCHOTTKY-BARRIER TO MEASURE IMPACT IONIZATION COEFFICIENTS IN SEMICONDUCTORS
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
WOODS, MH
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
JOHNSON, WC
LAMPERT, MA
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
LAMPERT, MA
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(03)
: 381
-
394
←
1
→
共 7 条
[1]
[Anonymous], 1977, SEMICONDUCTORS SEMIM
[2]
IONIZATION COEFFICIENTS OF ELECTRONS AND HOLES IN INP
ARMIENTO, CA
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
ARMIENTO, CA
GROVES, SH
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
GROVES, SH
HURWITZ, CE
论文数:
0
引用数:
0
h-index:
0
机构:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
HURWITZ, CE
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(04)
: 333
-
335
[3]
THE EFFECT OF ELECTRO-ABSORPTION ON THE DETERMINATION OF IONIZATION COEFFICIENTS
BULMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
BULMAN, GE
COOK, LW
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
COOK, LW
STILLMAN, GE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
STILLMAN, GE
[J].
APPLIED PHYSICS LETTERS,
1981,
39
(10)
: 813
-
815
[4]
ELECTRON AND HOLE IONIZATION RATES IN EPITAXIAL SILICON AT HIGH ELECTRIC-FIELDS
GRANT, WN
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS, MURRAY HILL, NJ 07974 USA
BELL TEL LABS, MURRAY HILL, NJ 07974 USA
GRANT, WN
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(10)
: 1189
-
1203
[5]
KAO CW, 1980, SOLID STATE ELECTRON, V23, P881, DOI 10.1016/0038-1101(80)90106-9
[6]
IONIZATION COEFFICIENTS MEASURED IN ABRUPT INP JUNCTIONS
UMEBU, I
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UMEBU, I
CHOUDHURY, ANMM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
CHOUDHURY, ANMM
ROBSON, PN
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
UNIV SHEFFIELD,DEPT ELECTR & ELECT ENGN,SHEFFIELD S1 3JD,S YORKSHIRE,ENGLAND
ROBSON, PN
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(04)
: 302
-
303
[7]
USE OF A SCHOTTKY-BARRIER TO MEASURE IMPACT IONIZATION COEFFICIENTS IN SEMICONDUCTORS
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
WOODS, MH
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
JOHNSON, WC
LAMPERT, MA
论文数:
0
引用数:
0
h-index:
0
机构:
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
PRINCETON UNIV, DEPT ELECT ENGN, PRINCETON, NJ 08540 USA
LAMPERT, MA
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(03)
: 381
-
394
←
1
→