HYDROGEN RATIOS AND PROFILES IN DEPOSITED AMORPHOUS AND POLYCRYSTALLINE FILMS AND IN METALS USING NUCLEAR TECHNIQUES

被引：14

作者：

BENENSON, RE ^{[1
]}

FELDMAN, LC ^{[1
]}

BAGLEY, BG ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

NUCLEAR INSTRUMENTS & METHODS | 1980年 / 168卷 / 1-3期

关键词：

D O I：

10.1016/0029-554X(80)91308-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：547 / 550

页数：4

共 14 条

[1] BAGLEY BG, 1979, B AM PHYS SOC, V24, P399
[2] BAGLEY BG, 1979, J ELECTROCHEM SOC, V16, pC127
[3] BAGLEY BG, UNPUBLISHED
[4] THEORETICAL ANALYSIS OF ENERGY-SPECTRA OF BACKSCATTERED IONS
BRICE, DK
[J]. THIN SOLID FILMS, 1973, 19 (01) : 121 - 135
[5] QUANTITATIVE-ANALYSIS OF HYDROGEN IN GLOW-DISCHARGE AMORPHOUS SILICON
BRODSKY, MH
FRISCH, MA
ZIEGLER, JF
LANFORD, WA
[J]. APPLIED PHYSICS LETTERS, 1977, 30 (11) : 561 - 563
[6] KNOLLE WR, UNPUBLISHED
[7] HYDROGEN CONTENT OF PLASMA-DEPOSITED SILICON-NITRIDE
LANFORD, WA
RAND, MJ
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) : 2473 - 2477
[8] N-15 HYDROGEN PROFILING - SCIENTIFIC APPLICATIONS
LANFORD, WA
[J]. NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3): : 1 - 8
[9] LANFORD WA, COMMUNICATION
[10] MARION JB, 1978, NUCLEAR REACTION ANA