VAPOR-PHASE SILICONIZING OF IRON PLATE AND CRYSTAL-GROWTH OF FESI2 USING SI2CL6 AS A SOURCE OF SILICON

被引：10

作者：

MOTOJIMA, S

HATTORI, T

YAMAGUCHI, K

机构：

[1] Gifu Univ, Gifu, Jpn, Gifu Univ, Gifu, Jpn

来源：

JOURNAL OF CRYSTAL GROWTH | 1987年 / 85卷 / 03期

关键词：

D O I：

10.1016/0022-0248(87)90458-1

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：309 / 317

页数：9

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