REFRACTIVE-INDEX FLUCTUATIONS IN DEFORMED TI-LINBO3 WAVE-GUIDES DUE TO SIO2 OVERLAYER DEPOSITION

被引:11
作者
NAGATA, H
KIUCHI, K
SUGAMATA, T
机构
[1] Sumitomo Cement Co. Ltd., Central Research Laboratories, Funabashi-shi, Chiba 274
关键词
D O I
10.1063/1.109789
中图分类号
O59 [应用物理学];
学科分类号
摘要
During the fabrication process of Ti:LiNbO3 optical modulators, the deformation into a convex configuration of the LiNbO3 wafer occurs after the deposition of the micrometer-thick SiO2 buffer layer. This deformation remains in the modulator chip and possibly generates the strain in the waveguides. The strain induced change of refractive index (DELTAn) in the waveguide is estimated from consideration of the piezo-optic effect. This DELTAn is on the order of 10(-5) and is close to that due to the electro-optic effect. The corresponding optical phase retardation is in agreement with measured values.
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页码:1176 / 1178
页数:3
相关论文
共 7 条
[1]  
KAWASHIMA H, 1992, IEICE T ELECTRON, V45, P21
[2]  
MITSUI T, 1981, NUMERICAL DATA FUN A, V16
[4]   TEMPERATURE-DEPENDENCE OF DC DRIFT OF TI-LINBO3 OPTICAL MODULATORS WITH SPUTTER-DEPOSITED SIO2 BUFFER LAYER [J].
NAGATA, H ;
KIUCHI, K .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (09) :4162-4164
[5]  
NISHIHARA H, 1985, HIKARI SHUUSEKI KAIR, pCH5
[6]  
SEINO K, 1992, FEB P OFC92 SAN JOS
[7]   INTRINSIC STRESS IN SPUTTERED THIN-FILMS [J].
WINDISCHMANN, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (04) :2431-2436