STRESS AND MICROSTRUCTURE OF SPUTTER-DEPOSITED THIN-FILMS - MOLECULAR-DYNAMICS INVESTIGATIONS

被引：217

作者：

MULLER, KH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.339559

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1796 / 1799

页数：4

共 11 条

[1] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION [J].

CUOMO, JJ ;

HARPER, JME ;

GUARNIERI, CR ;

YEE, DS ;

ATTANASIO, LJ ;

ANGILELLO, J ;

WU, CT ;

HAMMOND, RH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :349-354

[2] STATISTICAL MECHANICS OF SURFACE TENSION [J].

HARASIMA, A .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1953, 8 (03) :343-347

[3] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358

[4] A STATISTICAL-MECHANICAL THEORY OF SURFACE TENSION [J].

MACLELLAN, AG .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1952, 213 (1113) :274-284

[5] THERMALIZATION OF SPUTTERED ATOMS [J].

MEYER, K ;

SCHULLER, IK ;

FALCO, CM .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5803-5805

[6]

MULLER KH, IN PRESS SURF SCI

[7]

MULLER KH, IN PRESS PHYS REV B

[8]

SEGMULLER A, 1980, J APPL PHYS, V51, P6225

[9] THE INFLUENCE OF DISCHARGE CURRENT ON THE INTRINSIC STRESS IN MO FILMS DEPOSITED USING CYLINDRICAL AND PLANAR MAGNETRON SPUTTERING SOURCES [J].

THORNTON, JA ;

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :576-579

[10] HIGH-RATE THICK-FILM GROWTH [J].

THORNTON, JA .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 :239-260

← 1 2 →