THE INFLUENCE OF DISCHARGE CURRENT ON THE INTRINSIC STRESS IN MO FILMS DEPOSITED USING CYLINDRICAL AND PLANAR MAGNETRON SPUTTERING SOURCES

被引：173

作者：

THORNTON, JA

HOFFMAN, DW

机构：

[1] UNIV ILLINOIS,DEPT MET,URBANA,IL 61801

[2] FORD MOTOR CO,RES STAFF,DEARBORN,MI 48121

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572997

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：576 / 579

页数：4

共 25 条

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[2] HADSTRUM HD, 1977, INELASTIC ION SURFAC, P1
[3] COMPRESSIVE STRESS AND INERT-GAS IN MO FILMS SPUTTERED FROM A CYLINDRICAL POST MAGNETRON WITH NE, AR, KR, AND XE
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[4] INTERNAL-STRESSES IN SPUTTERED CHROMIUM
HOFFMAN, DW
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[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 355 - 363
[5] A SPUTTERING WIND
HOFFMAN, DW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 561 - 566
[6] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES
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THORNTON, JA
[J]. THIN SOLID FILMS, 1977, 45 (02) : 387 - 396
[7] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE
HOFFMAN, DW
THORNTON, JA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 355 - 358
[8] EFFECTS OF SUBSTRATE ORIENTATION AND ROTATION ON INTERNAL-STRESSES IN SPUTTERED METAL-FILMS
HOFFMAN, DW
THORNTON, JA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 134 - 137
[9] STRESS AND PROPERTY CONTROL IN SPUTTERED METAL-FILMS WITHOUT SUBSTRATE BIAS
HOFFMAN, DW
[J]. THIN SOLID FILMS, 1983, 107 (04) : 353 - 358
[10] HOFFMAN DW, 1983, 9 P INT VAC C 5TH IN