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STRESS AND PROPERTY CONTROL IN SPUTTERED METAL-FILMS WITHOUT SUBSTRATE BIAS

被引：65
作者：
HOFFMAN, DW
机构：
来源：
THIN SOLID FILMS | 1983年 / 107卷 / 04期
关键词：
D O I：
10.1016/0040-6090(83)90296-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：353 / 358
页数：6
相关论文
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[4]  
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[7]   CORRELATION BETWEEN THE ION-BOMBARDMENT DURING FILM GROWTH OF PD FILMS AND THEIR STRUCTURAL AND ELECTRICAL-PROPERTIES [J].
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