DESIGN AND CAPABILITIES OF A NOVEL CYLINDRICAL-POST MAGNETRON SPUTTERING SOURCE

被引：11

作者：

HOFFMAN, DW

机构：

来源：

THIN SOLID FILMS | 1982年 / 96卷 / 03期

关键词：

D O I：

10.1016/0040-6090(82)90245-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：217 / 224

页数：8

共 10 条

[1] COMPRESSIVE STRESS AND INERT-GAS IN MO FILMS SPUTTERED FROM A CYLINDRICAL POST MAGNETRON WITH NE, AR, KR, AND XE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :380-383

[2] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[3] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358

[4] SELF-SPUTTERING PHENOMENA IN HIGH-RATE COAXIAL CYLINDRICAL MAGNETRON SPUTTERING [J].

HOSOKAWA, N ;

TSUKADA, T ;

MISUMI, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :143-146

[5]

KNAUER W, 1963, 10TH T NATL VAC S BO, P180

[6]

Thornton J.A., 1978, THIN FILM PROCESS, V4, P75

[7] SUBSTRATE HEATING IN CYLINDRICAL MAGNETRON SPUTTERING SOURCES [J].

THORNTON, JA .

THIN SOLID FILMS, 1978, 54 (01) :23-31

[8] HIGH-RATE THICK-FILM GROWTH [J].

THORNTON, JA .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 :239-260

[9]

Waits R.K., 1978, THIN FILM PROCESSES, p[24, 131]

[10]

[No title captured]

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