INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE

被引：234

作者：

HOFFMAN, DW ^{[1
]}

THORNTON, JA ^{[1
]}

机构：

[1] TELIC CO,SANTA MONICA,CA 90404

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期

关键词：

D O I：

10.1116/1.571463

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：355 / 358

页数：4

共 20 条

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[7]

HOFFMAN DW, 1979, T SOC AUTOMOTIVE ENG, V88, P808

[8] STRUCTURE-COMPOSITION VARIATION IN RF-SPUTTERED FILMS OF GE CAUSED BY PROCESS PARAMETER CHANGES [J].

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[9] RF DIODE SPUTTERED PLATINUM FILMS [J].

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[10]

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