DEPTH PROFILING OF CATALYST SAMPLES - AN XPS-BASED MODEL FOR THE SPUTTERING BEHAVIOR OF POWDER MATERIALS

被引:23
作者
GONZALEZELIPE, AR [1 ]
ESPINOS, JP [1 ]
FERNANDEZ, A [1 ]
MUNUERA, G [1 ]
机构
[1] UNIV SEVILLA,CSIC,DEPT QUIM INORGAN,E-41071 SEVILLE,SPAIN
关键词
D O I
10.1016/0021-9517(91)90142-Q
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A model is presented to describe the depth profiles obtained by ion-bombarding polycrystalline multicomponent samples. Different calculations for idealized catalyst structures illustrate the possibilities of using the ion-sputtering technique for the characterization of catalysts. These calculations show that the depth profiles obtained using dispersed phase XPS intensities may provide semi-quantitative information on particle size, existence of solid solution, or formation of mono- or bimetallic particles in bimetallic catalysts. Examples with the dispersed phase in metallic or oxide forms that illustrate these applications are presented. © 1991.
引用
收藏
页码:627 / 641
页数:15
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