BAND-EDGE DISCONTINUITIES BETWEEN MICROCRYSTALLINE AND AMORPHOUS HYDROGENATED SILICON ALLOYS AND THEIR EFFECT ON SOLAR-CELL PERFORMANCE

被引:52
作者
XU, X [1 ]
YANG, J [1 ]
BANERJEE, A [1 ]
GUHA, S [1 ]
VASANTH, K [1 ]
WAGNER, S [1 ]
机构
[1] PRINCETON UNIV,DEPT ELECT ENGN,PRINCETON,NJ 08544
关键词
D O I
10.1063/1.114332
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have used internal photoemission measurements to determine the electrical band gap of microcrystalline p-type layers used in a-Si:H alloy solar cells, and the band edge discontinuities of the conduction and the valence bands between mu c-Si:H and a-Si:H alloys. The band gap of mu c-Si:H is found to be around 1.6 eV, and the discontinuities at the conduction and the valence band edges are -0.02 and 0.26 eV, respectively. Use of these parameters in the numerical simulation of single-junction a-Si:H alloy solar cells is found to accurately predict the experimental results of solar cell performance. (C) 1995 American Institute of Physics.
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页码:2323 / 2325
页数:3
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