SUPPRESSION OF CU DIFFUSION FROM A BULK ZNSE SUBSTRATE TO A HOMOEPITAXIAL LAYER BY SE-BEAM IRRADIATION AS A PREGROWTH TREATMENT

被引:13
作者
HISHIDA, YJ
TODA, T
YOSHIE, T
YAGI, K
YAMAGUCHI, T
NIINA, T
机构
[1] Microelectronics Research Center, Sanyo Electric Corporation, Ltd., Hirakata, Osaka 573
关键词
D O I
10.1063/1.111259
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cu diffusion of homoepitaxial ZnSe was investigated through low-temperature photoluminescence (PL) spectra and secondary ion mass spectroscopy. Though Cu in ZnSe normally diffuses easily, we found that Cu in a ZnSe substrate did not diffuse into the homoepitaxial layer when the substrate was heated under Se-beam irradiation prior to growth. Cu-related emissions, such as I1deep and Cu-green, disappeared from the PL spectrum of the homoepitaxial layer grown on the Se-beam irradiated substrate. This suppressed Cu diffusion can be explained by site transformation of interstitial Cu atoms in the ZnSe substrate into Cu atoms occupying the Zn lattice site. This treatment is very useful for improving the purity of homoepitaxial ZnSe layers.
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页码:3419 / 3421
页数:3
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