EFFECT OF SUBSTRATE-TEMPERATURE ON THE GROWTH-RATE AND SURFACE-MORPHOLOGY OF HETEROEPITAXIAL INDIUM-ANTIMONIDE LAYERS GROWN ON (100) GAAS BY METALORGANIC MAGNETRON SPUTTERING

被引：20

作者：

RAO, TS ^{[1
]}

HALPIN, C ^{[1
]}

WEBB, JB ^{[1
]}

NOAD, JP ^{[1
]}

MCCAFFREY, J ^{[1
]}

机构：

[1] COMMUN RES CTR,ADV DEVICES & RELIABIL DIRECTORATE,OTTAWA K2H 8S2,ONTARIO,CANADA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 02期

关键词：

D O I：

10.1063/1.343112

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：585 / 590

页数：6

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