TEMPERATURE AND ELECTRON-DENSITY MEASUREMENTS IN A HELIUM HYDROGEN CAPACITIVELY COUPLED MICROWAVE PLASMA

被引:32
作者
MASAMBA, WRL [1 ]
ALI, AH [1 ]
WINEFORDNER, JD [1 ]
机构
[1] UNIV FLORIDA,DEPT CHEM,GAINESVILLE,FL 32611
关键词
D O I
10.1016/0584-8547(92)80041-E
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Various temperature and electron density measurements have been carried out in a capacitively coupled microwave plasma (CMP) with a mixture of hydrogen and helium as the plasma gas using a photodiode array spectrometer for detection. Fe I lines were used for excitation temperature, OH lines for rotational temperature and the H(beta) line for electron number density measurements. Rotational temperatures were found to be between 1800 K and 3000 K. excitation temperatures varied between 2000 K and 5000 K and electron number densities varied between 4 x 10(14) cm-3 and 9 x 10(14) cm-3, depending on operating conditions. The influence of power, observation position, solution uptake rate and carrier gas flow have been investigated.
引用
收藏
页码:481 / 491
页数:11
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