ELECTRON NUMBER DENSITY STUDIES IN MODERATE-POWER ARGON AND HELIUM MICROWAVE-INDUCED PLASMAS

被引：23

作者：

BROWN, PG ^{[1
]}

BROTHERTON, TJ ^{[1
]}

WORKMAN, JM ^{[1
]}

CARUSO, JA ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT CHEM,CINCINNATI,OH 45221

来源：

APPLIED SPECTROSCOPY | 1987年 / 41卷 / 05期

关键词：

D O I：

10.1366/0003702874448175

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：774 / 779

页数：6

共 21 条

[1] ELECTRONIC EXCITATION AND IONIZATION TEMPERATURE-MEASUREMENTS IN A HIGH-FREQUENCY INDUCTIVELY COUPLED ARGON PLASMA SOURCE AND THE INFLUENCE OF WATER-VAPOR ON PLASMA PARAMETERS
ALDER, JF
BOMBELKA, RM
KIRKBRIGHT, GF
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1980, 35 (04) : 163 - 175
[2] ARZIMOVICH LA, 1965, ELEMENTARY PLASMA PH, P7
[3] RADIATIVE IONIZATION RECOMBINATION MODEL AND THE NONTHERMAL EXCITATION IN A MICROWAVE-INDUCED PLASMA AT 0.2 TORR
BRASSEM, P
MAESSEN, FJMJ
DEGALAN, L
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1978, 33 (10-1) : 753 - 764
[4] INFLUENCE OF FLOW-RATE AND PRESSURE ON EXCITATION CONDITIONS IN LOW-PRESSURE MICROWAVE INDUCED PLASMAS
BRASSEM, P
MAESSEN, FJMJ
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1975, 30 (12) : 547 - 556
[5] ELECTRON TEMPERATURES AND ELECTRON CONCENTRATIONS AT LOW-PRESSURE IN MICROWAVE INDUCED PLASMAS
BRASSEM, P
MAESSEN, FJM
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1974, 29 (7-8) : 203 - 210
[6] BRASSEM P, 1976, SPECTROCHIM ACTA B, V31, P485
[7] SPECTROSCOPIC TEMPERATURES OF A MODERATE-POWER ARGON MICROWAVE-INDUCED PLASMA
BROWN, PG
WORKMAN, JM
HAAS, DL
FLEITZ, PA
MILLER, DC
SELISKAR, CJ
CARUSO, JA
[J]. APPLIED SPECTROSCOPY, 1986, 40 (04) : 477 - 483
[8] FUNDAMENTAL PROPERTIES CHARACTERIZING LOW-PRESSURE MICROWAVE-INDUCED PLASMAS AS EXCITATION SOURCES FOR SPECTROANALYTICAL CHEMISTRY
BUSCH, KW
VICKERS, TJ
[J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1973, B 28 (03) : 85 - 104
[9] CARUSO JA, 1987, SPECTROCHIM ACTA B, V42
[10] CHEN FF, 1984, INTRO PLASMA PHYSICS, V1, P8

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