OXYGEN PLASMA ASHING EFFECTS ON ALUMINUM AND TITANIUM SPACE PROTECTIVE COATINGS

被引：8

作者：

SYNOWICKI, R

KUBIK, RD

HALE, JS

PETERKIN, J

NAFIS, S

WOOLLAM, JA

ZAAT, S

机构：

[1] UNIV NEBRASKA,DEPT ELECT ENGN,LINCOLN,NE 68588

[2] NASA,CTR COMMERCIAL DEV SPACE,CLEVELAND,OH 44135

[3] CASE WESTERN RESERVE UNIV,CLEVELAND,OH 44106

来源：

THIN SOLID FILMS | 1991年 / 206卷 / 1-2期

基金：

美国国家航空航天局;

关键词：

D O I：

10.1016/0040-6090(91)90431-V

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Using variable angle spectroscopic ellipsometry and atomic force microscopy (AFM), the surface roughness and oxidation of aluminum and titanium thin films have been studied as a function of substrate deposition temperature and oxygen plasma exposure. Increasing substrate deposition temperatures affect film microstructure by greatly increasing grain size. Short exposures to an oxygen plasma environment produce sharp spikes rising rapidly above the surface as seen by AFM. Ellipsometric measurements were made over a wide range of plasma exposure times, and results at longer exposure times suggest that the surface is greater than 30% void. This is qualitatively verified by the AFM images.

引用

页码：254 / 258

页数：5