THIN-FILM REACTIONS OF AL WITH CO, CR, MO, TA, TI, AND W

被引：40

作者：

COLGAN, EG ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

JOURNAL OF MATERIALS RESEARCH | 1989年 / 4卷 / 04期

关键词：

D O I：

10.1557/JMR.1989.0815

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：815 / 820

页数：6

共 29 条

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[4]

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[5]

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[6] VOID FORMATION IN THIN AL FILMS [J].

COLGAN, EG ;

LI, CY ;

MAYER, JW .

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[7] DIFFUSION MARKERS IN AL/METAL THIN-FILM REACTIONS [J].

COLGAN, EG ;

MAYER, JW .

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[8]

COLGAN EG, 1988, MATER RES SOC S P, V119, P109

[9] ALGORITHMS FOR THE RAPID SIMULATION OF RUTHERFORD BACKSCATTERING SPECTRA [J].

DOOLITTLE, LR .

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[10]

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