THE FORMATION OF TITANIUM, CHROMIUM, NIOBIUM AND ZIRCONIUM ALUMINIDES IN THIN-FILMS FOR INTERCONNECTIONS

The formation of transition metal aluminides in thin film reaction couples was explored using X-ray diffraction and differential scanning calorimetry. Kissinger-Ozawa analysis was applied to the calorimetry results to yield information on the kinetics of the reactions. The results indicate that transition metals from groups IV, V and VI show a range of interaction modes with aluminium and that these are modified significantly when copper is present as an alloying addition in the aluminium. These results have an important bearing on the selection of metals for use as interlayers in electromigration-resistant interconnections or as diffusion barriers.