INFLUENCE OF CU AS AN IMPURITY IN AL/TI AND AL/W THIN-FILM REACTIONS

被引：65

作者：

KRAFCSIK, I ^{[1
]}

GYULAI, J ^{[1
]}

PALMSTROM, CJ ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

关键词：

D O I：

10.1063/1.94212

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1015 / 1017

页数：3

共 14 条

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[9] ANOMALOUS GROWTH OF HFAL3 IN THIN-FILMS
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[10] DIFFUSION-BARRIERS IN LAYERED CONTACT STRUCTURES
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