1ST NUCLEATION RULE FOR SOLID-STATE NUCLEATION IN METAL-METAL THIN-FILM SYSTEMS

被引：83

作者：

BENE, RW ^{[1
]}

机构：

[1] UNIV TEXAS,ELECTR RES CTR,AUSTIN,TX 78712

来源：

关键词：

D O I：

10.1063/1.93578

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：529 / 531

页数：3

共 14 条

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[3] EFFECT OF A GLASSY MEMBRANE ON SCHOTTKY-BARRIER BETWEEN SILICON AND METALLIC SILICIDES
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (04): : 925 - 929
[4] BENE RW, 1978, P S THIN FILM PHENOM, P21
[5] CAMPISANO SU, 1978, P S THIN FILM PHENOM, P129
[6] INVESTIGATION OF PHASE GROWTH KINETICS IN THIN-FILM V-AL SYSTEM
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[J]. THIN SOLID FILMS, 1977, 42 (02) : 133 - 138
[7] KINETICS OF COMPOUND FORMATION IN THIN-FILM COUPLES OF AL AND TRANSITION-METALS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 68 - 71
[8] Phillips J. D., UNPUB
[9] THIN-FILM INTERDIFFUSION .1. AU-PD, PD-AU, TI-PD, TI-AU, TI-PD-AU, AND TI-AU-PD
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[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) : 4275 - 4283
[10] Recrystallization of metals and salts
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