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UNIFORM GROWTH OF GAAS BY MOCVD ON MULTI-WAFERS
被引:11
作者
:
IKEDA, M
论文数:
0
引用数:
0
h-index:
0
IKEDA, M
KOJIMA, S
论文数:
0
引用数:
0
h-index:
0
KOJIMA, S
KASHIWAYANAGI, Y
论文数:
0
引用数:
0
h-index:
0
KASHIWAYANAGI, Y
机构
:
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1986年
/ 77卷
/ 1-3期
关键词
:
D O I
:
10.1016/0022-0248(86)90296-4
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:157 / 162
页数:6
相关论文
共 5 条
[1]
BASS SJ, 1977, I PHYSICS C SERIES B, V33, P1
[2]
A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
EVERSTEYN, FC
论文数:
0
引用数:
0
h-index:
0
EVERSTEYN, FC
SEVERIN, PJW
论文数:
0
引用数:
0
h-index:
0
SEVERIN, PJW
BREKEL, CHJV
论文数:
0
引用数:
0
h-index:
0
BREKEL, CHJV
PEEK, HL
论文数:
0
引用数:
0
h-index:
0
PEEK, HL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(07)
: 925
-
+
[3]
THE OMVPE GROWTH OF GAAS AND GAALAS ON A LARGE-SCALE
HERSEE, SD
论文数:
0
引用数:
0
h-index:
0
HERSEE, SD
BALDY, M
论文数:
0
引用数:
0
h-index:
0
BALDY, M
ASSENAT, P
论文数:
0
引用数:
0
h-index:
0
ASSENAT, P
HYGHE, D
论文数:
0
引用数:
0
h-index:
0
HYGHE, D
BONNET, M
论文数:
0
引用数:
0
h-index:
0
BONNET, M
DUCHEMIN, JP
论文数:
0
引用数:
0
h-index:
0
DUCHEMIN, JP
[J].
JOURNAL DE PHYSIQUE,
1982,
43
(NC-5):
: 119
-
126
[4]
PROPERTIES OF GAAS-SI EPITAXIAL LAYERS GROWN IN A MULTIWAFER MOCVD REACTOR
KANBER, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
KANBER, H
ZIELINSKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
ZIELINSKI, T
WHELAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
WHELAN, JM
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1985,
14
(06)
: 769
-
781
[5]
LARGE-SCALE GROWTH OF GAAS EPITAXIAL LAYERS BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION
TANDON, JL
论文数:
0
引用数:
0
h-index:
0
机构:
Applied Solar Energy Corp, City of, Industry, CA, USA, Applied Solar Energy Corp, City of Industry, CA, USA
TANDON, JL
YEH, YCM
论文数:
0
引用数:
0
h-index:
0
机构:
Applied Solar Energy Corp, City of, Industry, CA, USA, Applied Solar Energy Corp, City of Industry, CA, USA
YEH, YCM
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(03)
: 662
-
668
←
1
→
共 5 条
[1]
BASS SJ, 1977, I PHYSICS C SERIES B, V33, P1
[2]
A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
EVERSTEYN, FC
论文数:
0
引用数:
0
h-index:
0
EVERSTEYN, FC
SEVERIN, PJW
论文数:
0
引用数:
0
h-index:
0
SEVERIN, PJW
BREKEL, CHJV
论文数:
0
引用数:
0
h-index:
0
BREKEL, CHJV
PEEK, HL
论文数:
0
引用数:
0
h-index:
0
PEEK, HL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(07)
: 925
-
+
[3]
THE OMVPE GROWTH OF GAAS AND GAALAS ON A LARGE-SCALE
HERSEE, SD
论文数:
0
引用数:
0
h-index:
0
HERSEE, SD
BALDY, M
论文数:
0
引用数:
0
h-index:
0
BALDY, M
ASSENAT, P
论文数:
0
引用数:
0
h-index:
0
ASSENAT, P
HYGHE, D
论文数:
0
引用数:
0
h-index:
0
HYGHE, D
BONNET, M
论文数:
0
引用数:
0
h-index:
0
BONNET, M
DUCHEMIN, JP
论文数:
0
引用数:
0
h-index:
0
DUCHEMIN, JP
[J].
JOURNAL DE PHYSIQUE,
1982,
43
(NC-5):
: 119
-
126
[4]
PROPERTIES OF GAAS-SI EPITAXIAL LAYERS GROWN IN A MULTIWAFER MOCVD REACTOR
KANBER, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
KANBER, H
ZIELINSKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
ZIELINSKI, T
WHELAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
WHELAN, JM
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1985,
14
(06)
: 769
-
781
[5]
LARGE-SCALE GROWTH OF GAAS EPITAXIAL LAYERS BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION
TANDON, JL
论文数:
0
引用数:
0
h-index:
0
机构:
Applied Solar Energy Corp, City of, Industry, CA, USA, Applied Solar Energy Corp, City of Industry, CA, USA
TANDON, JL
YEH, YCM
论文数:
0
引用数:
0
h-index:
0
机构:
Applied Solar Energy Corp, City of, Industry, CA, USA, Applied Solar Energy Corp, City of Industry, CA, USA
YEH, YCM
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(03)
: 662
-
668
←
1
→