FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS

[31] LAINER DI, 1968, SOV PHYS CRYSTALLOGR, V12, P913

[32] TEMPERATURE RISE DURING FILM DEPOSITION BY RF AND DC SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (04): : 1196 - &

[33] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &

[34] FORMATION OF FCC BCC AND BETA-TANTALUM FILMS BY EVAPORATION [J]. THIN SOLID FILMS, 1968, 2 (5-6) : 467 - &

[35] ELECTRICAL AND STRUCTURAL PROPERTIES OF EPITAXIAL BCC TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (08) : 3121 - &

[36] MASESSA AJ, UNPUBLISHED WORK

[37] MCLEAN DA, 1966, J ELECTROCHEM SOC JP, V34, P1

[38] Mills D. J, 1966, J CAN CERAM SOC, V35, P48

[39] MISKA E, 1967, COMPT REND B, V263, P1267

[40] DESORBABILITY OF CHEMISORBED WATER ON METAL OXIDE SURFACES .I. DESORPTION TEMPERATURE OF CHEMISORBED WATER ON HEMATITE RUTILE AND ZINC OXIDE [J]. BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1968, 41 (07) : 1533 - +

[31] LAINER DI, 1968, SOV PHYS CRYSTALLOGR, V12, P913

[32] TEMPERATURE RISE DURING FILM DEPOSITION BY RF AND DC SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (04): : 1196 - &

[33] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &

[34] FORMATION OF FCC BCC AND BETA-TANTALUM FILMS BY EVAPORATION [J]. THIN SOLID FILMS, 1968, 2 (5-6) : 467 - &

[35] ELECTRICAL AND STRUCTURAL PROPERTIES OF EPITAXIAL BCC TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (08) : 3121 - &

[36] MASESSA AJ, UNPUBLISHED WORK

[37] MCLEAN DA, 1966, J ELECTROCHEM SOC JP, V34, P1

[38] Mills D. J, 1966, J CAN CERAM SOC, V35, P48

[39] MISKA E, 1967, COMPT REND B, V263, P1267

[40] DESORBABILITY OF CHEMISORBED WATER ON METAL OXIDE SURFACES .I. DESORPTION TEMPERATURE OF CHEMISORBED WATER ON HEMATITE RUTILE AND ZINC OXIDE [J]. BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1968, 41 (07) : 1533 - +