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DIELECTRIC CHARACTERISTICS OF DOUBLE-LAYER STRUCTURE OF EXTREMELY THIN TA2O5/SIO2 ON SI
被引:72
作者
:
NISHIOKA, Y
论文数:
0
引用数:
0
h-index:
0
NISHIOKA, Y
KIMURA, S
论文数:
0
引用数:
0
h-index:
0
KIMURA, S
SHINRIKI, H
论文数:
0
引用数:
0
h-index:
0
SHINRIKI, H
MUKAI, K
论文数:
0
引用数:
0
h-index:
0
MUKAI, K
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1987年
/ 134卷
/ 02期
关键词
:
D O I
:
10.1149/1.2100469
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:410 / 415
页数:6
相关论文
共 15 条
[11]
NISHIOKA Y, 1984, ELECTROCHEMICAL SOC, V841, P190
[12]
QUADRUPLY SELF-ALIGNED STACKED HIGH-CAPACITANCE RAM USING TA2O5 HIGH-DENSITY VLSI DYNAMIC MEMORY
OHTA, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
OHTA, K
YAMADA, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
YAMADA, K
SHIMIZU, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
SHIMIZU, K
TARUI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
TARUI, Y
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1982,
29
(03)
: 368
-
376
[13]
OPTICAL AND ELECTRICAL-PROPERTIES OF THERMAL TANTALUM OXIDE-FILMS ON SILICON
SMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SMITH, DJ
YOUNG, L
论文数:
0
引用数:
0
h-index:
0
YOUNG, L
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(01)
: 22
-
27
[14]
DC ELECTRICAL-CONDUCTION IN THIN TA2O5 FILMS .2. HIGHLY IMPERFECT FILMS
YOUNG, PL
论文数:
0
引用数:
0
h-index:
0
机构:
CORNING GLASS WORKS,CORNING,NY 14830
CORNING GLASS WORKS,CORNING,NY 14830
YOUNG, PL
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(01)
: 242
-
247
[15]
DC ELECTRICAL-CONDUCTION IN THIN TA2O5 FILMS .1. BULK-LIMITED CONDUCTION
YOUNG, PL
论文数:
0
引用数:
0
h-index:
0
机构:
CORNING GLASS WORKS,RES & DEV LABS,CORNING,NY 14830
CORNING GLASS WORKS,RES & DEV LABS,CORNING,NY 14830
YOUNG, PL
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(01)
: 235
-
241
←
1
2
→
共 15 条
[11]
NISHIOKA Y, 1984, ELECTROCHEMICAL SOC, V841, P190
[12]
QUADRUPLY SELF-ALIGNED STACKED HIGH-CAPACITANCE RAM USING TA2O5 HIGH-DENSITY VLSI DYNAMIC MEMORY
OHTA, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
OHTA, K
YAMADA, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
YAMADA, K
SHIMIZU, K
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
SHIMIZU, K
TARUI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
ELECTROTECH LABS,SAKURAMURA,IBARAKI,JAPAN
TARUI, Y
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1982,
29
(03)
: 368
-
376
[13]
OPTICAL AND ELECTRICAL-PROPERTIES OF THERMAL TANTALUM OXIDE-FILMS ON SILICON
SMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SMITH, DJ
YOUNG, L
论文数:
0
引用数:
0
h-index:
0
YOUNG, L
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(01)
: 22
-
27
[14]
DC ELECTRICAL-CONDUCTION IN THIN TA2O5 FILMS .2. HIGHLY IMPERFECT FILMS
YOUNG, PL
论文数:
0
引用数:
0
h-index:
0
机构:
CORNING GLASS WORKS,CORNING,NY 14830
CORNING GLASS WORKS,CORNING,NY 14830
YOUNG, PL
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(01)
: 242
-
247
[15]
DC ELECTRICAL-CONDUCTION IN THIN TA2O5 FILMS .1. BULK-LIMITED CONDUCTION
YOUNG, PL
论文数:
0
引用数:
0
h-index:
0
机构:
CORNING GLASS WORKS,RES & DEV LABS,CORNING,NY 14830
CORNING GLASS WORKS,RES & DEV LABS,CORNING,NY 14830
YOUNG, PL
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(01)
: 235
-
241
←
1
2
→