INFLUENCE OF THE SUBSTRATE ON THE TEMPERATURE INDUCED BY PULSED LASER IRRADIATION OF THIN-FILMS

被引：7

作者：

JADIN, A ^{[1
]}

FILIOUGUINE, IV ^{[1
]}

WAUTELET, M ^{[1
]}

LAUDE, LD ^{[1
]}

机构：

[1] MOSCOW ENGN PHYS INST,MOSCOW,USSR

来源：

APPLIED SURFACE SCIENCE | 1990年 / 46卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(90)90173-W

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

When the thickness of thin films compares with the light absorption length and the diffusion length of heat during pulsed laser irradiation, the thermal properties of the substrate influence the temperature in the film. In order to understand these phenomena, numerical simulation of temperature of thin film-substrate systems are performed. The influence of the nature of the substrate and of the thickness of the film is studied. © 1990.

引用

页码：375 / 377

页数：3

共 6 条

[1]

BAUERLE D, 1986, CHEM PROCESSING LASE

[2] ELECTRONIC SURFACE-PROPERTIES OF A LIQUID SEMICONDUCTOR - SELENIUM [J].