SEMIMETAL-TO-SEMICONDUCTOR TRANSITION IN BISMUTH THIN-FILMS

被引:252
作者
HOFFMAN, CA [1 ]
MEYER, JR [1 ]
BARTOLI, FJ [1 ]
DIVENERE, A [1 ]
YI, XJ [1 ]
HOU, CL [1 ]
WANG, HC [1 ]
KETTERSON, JB [1 ]
WONG, GK [1 ]
机构
[1] NORTHWESTERN UNIV,DEPT PHYS & ASTRON,EVANSTON,IL 60208
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 15期
关键词
D O I
10.1103/PhysRevB.48.11431
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Field- and temperature-dependent magnetotransport measurements on Bi layers grown by molecular-beam epitaxy have been analyzed by mixed-conduction techniques. In the thin-film limit, the net hole density scales inversely with layer thickness while the mobility scales linearly. By studying the minority electron concentration as a function of temperature in the range 100-300 K, we have unambiguously confirmed the long-standing theoretical prediction that quantum confinement should convert Bi from a semimetal to a semiconductor at a critical thickness on the order of 300 angstrom.
引用
收藏
页码:11431 / 11434
页数:4
相关论文
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