ELECTRON-DIFFRACTION STUDIES OF AG PHOTODOPING IN GEXSE1-X GLASS-FILMS

被引：36

作者：

CHEN, CH

TAI, KL

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 07期

关键词：

D O I：

10.1063/1.92034

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：605 / 607

页数：3

共 11 条

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[9]

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[10] NOVEL INORGANIC PHOTORESIST UTILIZING AG PHOTODOPING IN SE-GE GLASS-FILMS [J].

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