PARTICLE CONTAMINATION IN IMPLANTERS

被引：7

作者：

SMITH, TC

机构：

来源：

关键词：

D O I：

10.1016/0168-583X(89)90229-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：486 / 491

页数：6

共 24 条

[1]

Batchelder J. S., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V774, P8, DOI 10.1117/12.940381

[2]

BORDEN P, 1987, MICROCONTAMINATION, V5, P30

[3]

BOWLING RA, 1986, MICROCONTAMINATION C, P161

[4]

CHEN D, IN PRESS J VAC SCI T

[5]

CHEUNG SD, 1987, MICROCONTAMINATION, V5, P45

[6]

CURRENT M, 1987, JUL GREAT SIL VALL I

[7] PARTICLES AND PARTICLE-TRANSPORT IN ION IMPLANTERS [J].

DOUGLASHAMILTON, DH ;

TAYLOR, C .

[8]

DURRANT N, 1985, APR KOD MICR SEM INT

[9] YIELD IMPLICATIONS AND SCALING LAWS FOR SUBMICROMETER DEVICES [J].

FERRISPRABHU, AV .

[10]

Hancock S., 1984, Semiconductor International, V7, P144