PT2AL3 FORMATION ON EVAPORATED AND LARGE-GRAINED AL SUBSTRATES

[1] [Anonymous], 1967, HDB LATTICE SPACINGS

[2] Colgan E. G., 1987, Journal of Materials Research, V2, P557, DOI 10.1557/JMR.1987.0557

[3] PHASE FORMATION AND DISSOCIATION IN THE THIN-FILM PT/AL SYSTEM [J]. JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) : 1224 - 1231

[4] VOID FORMATION IN THIN AL FILMS [J]. APPLIED PHYSICS LETTERS, 1987, 51 (06) : 424 - 426

[5] DIFFUSION MARKERS IN AL/METAL THIN-FILM REACTIONS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 17 (03) : 242 - 249

[6] COLGAN EG, IN PRESS MATER RES S

[7] COLGAN EG, 1987, THESIS CORNELL U

[8] DIFFUSION OF SILICON IN PD2SI DURING SILICIDE FORMATION [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) : 1173 - 1177

[9] Fraser D. B., 1983, VLSI technology, P347

[10] KINETICS OF COMPOUND FORMATION IN THIN-FILM COUPLES OF AL AND TRANSITION-METALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 68 - 71

[1] [Anonymous], 1967, HDB LATTICE SPACINGS

[2] Colgan E. G., 1987, Journal of Materials Research, V2, P557, DOI 10.1557/JMR.1987.0557

[3] PHASE FORMATION AND DISSOCIATION IN THE THIN-FILM PT/AL SYSTEM [J]. JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) : 1224 - 1231

[4] VOID FORMATION IN THIN AL FILMS [J]. APPLIED PHYSICS LETTERS, 1987, 51 (06) : 424 - 426

[5] DIFFUSION MARKERS IN AL/METAL THIN-FILM REACTIONS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 17 (03) : 242 - 249

[6] COLGAN EG, IN PRESS MATER RES S

[7] COLGAN EG, 1987, THESIS CORNELL U

[8] DIFFUSION OF SILICON IN PD2SI DURING SILICIDE FORMATION [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) : 1173 - 1177

[9] Fraser D. B., 1983, VLSI technology, P347

[10] KINETICS OF COMPOUND FORMATION IN THIN-FILM COUPLES OF AL AND TRANSITION-METALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 68 - 71