DIFFUSION OF SILICON IN PD2SI DURING SILICIDE FORMATION

[1] BARTUR M, 1983, J APPL PHYS, V54, P5407

[2] CO2SI, CRSI2, ZRSI2 AND TISI2 FORMATION STUDIED BY A RADIOACTIVE SI-31 MARKER TECHNIQUE [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 127 - 133

[3] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J]. THIN SOLID FILMS, 1975, 25 (02) : 393 - 402

[4] REORDERING OF POLYCRYSTALLINE PD2SI ON EPITAXIAL PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2402 - 2405

[5] COMRIE CM, UNPUB

[6] EGAN JM, 1986, THESIS U CAPE TOWN

[7] FOLL H, 1981, J APPL PHYS, V52, P5110

[8] AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 227 - 231

[9] A STRUCTURE MARKER STUDY FOR PD2SI FORMATION - PD MOVES IN EPITAXIAL PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 224 - 226

[10] PROFILE OF TRACER SI IN SILICIDE WHEN SI DIFFUSES BY VACANCY MECHANISM [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (10) : 4554 - 4559

[1] BARTUR M, 1983, J APPL PHYS, V54, P5407

[2] CO2SI, CRSI2, ZRSI2 AND TISI2 FORMATION STUDIED BY A RADIOACTIVE SI-31 MARKER TECHNIQUE [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 127 - 133

[3] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J]. THIN SOLID FILMS, 1975, 25 (02) : 393 - 402

[4] REORDERING OF POLYCRYSTALLINE PD2SI ON EPITAXIAL PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2402 - 2405

[5] COMRIE CM, UNPUB

[6] EGAN JM, 1986, THESIS U CAPE TOWN

[7] FOLL H, 1981, J APPL PHYS, V52, P5110

[8] AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 227 - 231

[9] A STRUCTURE MARKER STUDY FOR PD2SI FORMATION - PD MOVES IN EPITAXIAL PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 224 - 226

[10] PROFILE OF TRACER SI IN SILICIDE WHEN SI DIFFUSES BY VACANCY MECHANISM [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (10) : 4554 - 4559