GRAPHO-EPITAXY OF SILICON ON FUSED-SILICA USING SURFACE MICROPATTERNS AND LASER CRYSTALLIZATION

被引：37

作者：

GEIS, MW ^{[1
]}

FLANDERS, DC ^{[1
]}

SMITH, HI ^{[1
]}

ANTONIADIS, DA ^{[1
]}

机构：

[1] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570261

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1640 / 1643

页数：4

共 15 条

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[6]

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[7] CRYSTALLOGRAPHIC ORIENTATION OF SILICON ON AN AMORPHOUS SUBSTRATE USING AN ARTIFICIAL SURFACE-RELIEF GRATING AND LASER CRYSTALLIZATION [J].

GEIS, MW ;

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