ULTRAVIOLET PHOTOELECTRON SPECTROSCOPIC STUDY OF THE SURFACE ETCHING OF AIR-OXIDIZED HYDROGENATED AMORPHOUS-SILICON BY AQUEOUS HYDROFLUORIC-ACID SOLUTION

被引：5

作者：

BEKKAY, T

SACHER, E

YELON, A

机构：

[1] ECOLE POLYTECH,GRP COUCHES MINCES,MONTREAL H3C 3A7,QUEBEC,CANADA

[2] ECOLE POLYTECH,DEPT GENIE PHYS,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

APPLIED SURFACE SCIENCE | 1992年 / 59卷 / 3-4期

基金：

加拿大自然科学与工程研究理事会;

关键词：

D O I：

10.1016/0169-4332(92)90123-F

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The UPS spectra of air-oxidized hydrogenated amorphous silicon, before and after etching by aqueous HF, are shown to be separable into their previously established components. These results are then used to confirm that the attack of aqueous HF proceeds though a mechanism in which surface Si atoms are H-passivated.

引用

页码：239 / 243

页数：5

共 35 条

[1]

ALLEN DC, 1980, PHYS REV LETT, V44, P43

[2]

ALLEN DC, 1982, PHYS REV B, V25, P1065

[3] DECONVOLUTION OF UPS AND XPS SPECTRA [J].