ANALYSIS OF UHLIG DEFECT MODEL OF OXIDATION KINETICS

被引：14

作者：

FROMHOLD, AT

机构：

来源：

关键词：

D O I：

10.1149/1.2411462

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：882 / &

共 34 条

[11] GLASSTONE S, 1941, THEORY RATE PROCESSE, P98
[12] HOLMES PJ, 1962, ELECTROCHEMISTRY SEM, P86
[13] Jackson J.D., 1962, CLASSICAL ELECTRODYN, V1st, P12
[14] Jackson J.D., 1962, CLASSICAL ELECTRODYN, P616
[15] JACKSON JD, 1962, CLASSICAL ELECTRODYN, P13
[16] JACKSON JD, 1962, CLASSICAL ELECTRODYN, P615
[17] JACKSON JD, 1962, CLASSICAL ELECTRODYN, P109
[18] COMMENTS ON PAPER TRANSPORT PROCESSES IN THERMAL OXIDATION OF SILICON
JORGENSEN, PJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (08) : 820 - +
[19] MORSE PM, 1953, METHODS THEORETICAL, P7
[20] MOTT NF, 1947, T FARADAY SOC, V43, P431