COMMENTS ON PAPER TRANSPORT PROCESSES IN THERMAL OXIDATION OF SILICON

[1] TRANSPORT PROCESSES IN THERMAL GROWTH OF METAL AND SEMICONDUCTOR OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (2P1) : 167 - +

[2] EFFECT OF AN ELECTRIC FIELD ON SILICON OXIDATION [J]. JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) : 874 - &

[3] JORGENSEN P, TO BE PUBLISHED

[4] JORGENSEN PJ, 1966, 7 INT C GLASS, P310

[5] KROGER FA, 1964, CHEMISTRY IMPERFECT

[6] KROGER FA, 1964, P BRIT CERAMIC SOC, V1, P167

[7] TRANSPORT PROCESSES IN THERMAL OXIDATION OF SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (08) : 782 - +

[8] Schmalzried H, 1963, PHYS CHEM FRANKFURT, V38, P87

[9] WAGNER C, PRIVATE COMMUNICATIO

[1] TRANSPORT PROCESSES IN THERMAL GROWTH OF METAL AND SEMICONDUCTOR OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (2P1) : 167 - +

[2] EFFECT OF AN ELECTRIC FIELD ON SILICON OXIDATION [J]. JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) : 874 - &

[3] JORGENSEN P, TO BE PUBLISHED

[4] JORGENSEN PJ, 1966, 7 INT C GLASS, P310

[5] KROGER FA, 1964, CHEMISTRY IMPERFECT

[6] KROGER FA, 1964, P BRIT CERAMIC SOC, V1, P167

[7] TRANSPORT PROCESSES IN THERMAL OXIDATION OF SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (08) : 782 - +

[8] Schmalzried H, 1963, PHYS CHEM FRANKFURT, V38, P87

[9] WAGNER C, PRIVATE COMMUNICATIO