AUGER-ELECTRON SPECTROSCOPY DEPTH PROFILING OF NI-CR MULTILAYERS BY SPUTTERING WITH N-2+ IONS

被引:67
作者
HOFMANN, S [1 ]
ZALAR, A [1 ]
机构
[1] INST ELECTR & VACUUM TECH, LJUBLJANA, YUGOSLAVIA
关键词
D O I
10.1016/0040-6090(79)90190-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Depth profiles of Ni/Cr multilayer sandwich samples composed of 14 alternating layers (of individual thickness 11.5 nm) have been obtained by Auger electron spectroscopy in combination with sputtering by either 1 keV N2+ ions or 1 keV Ar+ ions. Each yields a similar depth resolution which follows a z 1 2 law with sputter depth z in both cases. The relative amount of implanted primary ions is found to be inversely proportional to the sputtering rate. It can be used as a measure of instantaneous surface composition and for a normalization of the sputtering time to obtain a true (linear) depth scale. © 1979.
引用
收藏
页码:201 / 211
页数:11
相关论文
共 36 条