ELECTRICAL CHARACTERISTICS OF THE INTERFACE BETWEEN LASER-RECRYSTALLIZED POLYCRYSTALLINE SILICON AND THE UNDERLYING INSULATOR

被引:7
作者
LE, HP [1 ]
LAM, HW [1 ]
机构
[1] TEXAS INSTRUMENTS INC,CENT RES LABS,DALLAS,TX 75265
来源
ELECTRON DEVICE LETTERS | 1982年 / 3卷 / 06期
关键词
D O I
10.1109/EDL.1982.25522
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:161 / 163
页数:3
相关论文
共 6 条
[1]   A HIGH-DENSITY CMOS INVERTER WITH STACKED TRANSISTORS [J].
COLINGE, JP ;
DEMOULIN, E .
ELECTRON DEVICE LETTERS, 1981, 2 (10) :250-251
[2]   LASER-SCANNING APPARATUS FOR ANNEALING OF ION-IMPLANTATION DAMAGE IN SEMICONDUCTORS [J].
GAT, A ;
GIBBONS, JF .
APPLIED PHYSICS LETTERS, 1978, 32 (03) :142-144
[3]   ONE-GATE-WIDE CMOS INVERTER ON LASER-RECRYSTALLIZED POLYSILICON [J].
GIBBONS, JF ;
LEE, KF .
ELECTRON DEVICE LETTERS, 1980, 1 (06) :117-118
[5]   CHARGES AT A LASER-RECRYSTALLIZED-POLYCRYSTALLINE-SILICON-INSULATOR INTERFACE [J].
KAMINS, TI ;
LEE, KF ;
GIBBONS, JF .
ELECTRON DEVICE LETTERS, 1980, 1 (01) :5-7
[6]  
LAM HW, 1982, IEEE T ELECTRON DEV, V29, P389, DOI 10.1109/T-ED.1982.20713