THERMAL-DESORPTION SPECTROSCOPY OF BORON CARBON-FILMS AFTER KEV DEUTERIUM IRRADIATION

被引:12
作者
YAMAKI, T [1 ]
GOTOH, Y [1 ]
ANDO, T [1 ]
JIMBOU, R [1 ]
OGIWARA, N [1 ]
SAIDOH, M [1 ]
机构
[1] JAERI, NAKA FUS RES ESTAB, NAKA, IBARAKI 31101, JAPAN
关键词
D O I
10.1016/0022-3115(94)90315-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thermal desorption spectroscopy (TDS) of D2 and CD4 was done on boron/carbon films (B/(B + C) = 0-74%), after 3 keV D3+ irradiation to 4.5 x 10(17) D/cm2 at 473 K. The D2 desorption peaks were observed at 1050, 850 and 650 K. For a sputter B/C film (0%), only the 1050 K peak was observed. With increasing boron concentration to 3%, a sharp peak appeared at 850 K, the intensity of which was found to increase with increasing boron concentration to 23%, and then to decrease at 74%. The 650 K shoulder, which was observed for high boron concentration specimens, was speculated to be deuterium trapped by boron atoms in the boron clusters. The relative amount of CD4 desorption was found to decrease with increasing boron concentration, which was attributed to the decrease in the trapped deuterium concentration in the implantation layer at temperatures at which CD4 desorption proceeds.
引用
收藏
页码:154 / 160
页数:7
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