METALLURGICAL ASPECTS OF THE FORMATION OF SILICIDES

被引：78

作者：

OTTAVIANI, G

机构：

[1] Modena Univ, Modena, Italy, Modena Univ, Modena, Italy

来源：

THIN SOLID FILMS | 1986年 / 140卷 / 01期

关键词：

I should like to thank K. N. Tu for his commentsT.h e patienceo f my daughter Stefaniai n helping to edit the manuscripti; s also acknowledgedT.h is work was partiallys upportedb y the MinisteroP ubblicaI nstruzione;

D O I：

10.1016/0040-6090(86)90154-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3 / 21

页数：19

共 43 条

[1] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J].

CANALI, C ;

CATELLANI, C ;

PRUDENZIATI, M ;

WADLIN, WH ;

EVANS, CA .

APPLIED PHYSICS LETTERS, 1977, 31 (01) :43-45

[2] REFRACTORY-METAL SILICIDES - THIN-FILM PROPERTIES AND PROCESSING TECHNOLOGY [J].

CHOW, TP ;

STECKL, AJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (11) :1480-1497

[3]

CLAASSEN RS, 1975, UNPUB PHYS TODAY, V23

[4]

DHEURLE FM, 1984, 2 MAT RES SOC S P TH, V25, P3

[5] FORMATION OF SHALLOW SILICIDE CONTACTS OF HIGH SCHOTTKY-BARRIER ON SI - ALLOYING PD AND PT WITH W VS ALLOYING PD AND PT WITH SI [J].

EIZENBERG, M ;

TU, KN .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1577-1585

[6]

Elliot R. P., 1965, CONSTITUTION BINAR S

[7] EUTECTIC MELTING BY PULSED ION-BEAM IRRADIATION [J].

FASTOW, R ;

MAYER, JW ;

BRAT, T ;

EIZENBERG, M ;

OLOWOLAFE, JO .

APPLIED PHYSICS LETTERS, 1985, 46 (11) :1052-1054

[8]

GAGE PR, 1965, T METALL SOC AIME, V233, P832

[9]

GHATE PB, 1982, THIN SOLID FILMS, V93, P371

[10] DIFFUSION IN AMORPHOUS PHASE OF PD-19-AT PERCENT-SI METALLIC ALLOY [J].

GUPTA, D ;

TU, KN ;

ASAI, KW .

PHYSICAL REVIEW LETTERS, 1975, 35 (12) :796-799

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