FIELD EMISSION FROM SILICON AND GERMANIUM - FIELD DESORPTION AND SURFACE MIGRATION

被引：70

作者：

ALLEN, FG

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1961年 / 19卷 / 1-2期

关键词：

D O I：

10.1016/0022-3697(61)90061-0

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：87 / &

共 61 条

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ALLEN, FG ;

FOWLER, AB .

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[6]

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[7]

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[8]

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[9] SURFACE STATES AND RECTIFICATION AT A METAL SEMI-CONDUCTOR CONTACT [J].

BARDEEN, J .

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[10] THE USE OF THE FIELD EMISSION ELECTRON MICROSCOPE IN ADSORPTION STUDIES OF W ON W AND BA ON W [J].

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BELL SYSTEM TECHNICAL JOURNAL, 1951, 30 (04) :907-932

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