LOW-TEMPERATURE GROWTH OF ZNO FILM BY PHOTO-MOCVD

被引：35

作者：

SHIMIZU, M

KAMEI, H

TANIZAWA, M

SHIOSAKI, T

KAWABATA, A

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1988年 / 89卷 / 04期

关键词：

D O I：

10.1016/0022-0248(88)90195-9

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：365 / 370

页数：6

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共 21 条

[1] BOYER PK, 1983, LASER DIAGONOSTICS P
[2] UV PHOTOLYSIS OF VANDERWAALS MOLECULAR FILMS
EHRLICH, DJ
OSGOOD, RM
[J]. CHEMICAL PHYSICS LETTERS, 1981, 79 (02) : 381 - 388
[3] SEPARATION OF THE ABSORPTION SPECTRA OF NO2 AND N2O4 IN THE RANGE OF 2400-5000A
HALL, TC
BLACET, FE
[J]. JOURNAL OF CHEMICAL PHYSICS, 1952, 20 (11) : 1745 - 1749
[4] HARTMAN P, 1963, PHYSICS CHEM ORGANIC
[5] HAYAKAWA S, 1982, THIN FILM TECHNOLOGY
[6] PHOTOCHEMISTRY OF NOX AND HNOX COMPOUNDS
JOHNSTON, HS
GRAHAM, R
[J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1974, 52 (08): : 1415 - 1423
[7] PHOTOLYSIS OF NITROGEN-DIOXIDE
JONES, ITN
BAYES, KD
[J]. JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (09) : 4836 - 4844
[8] CHEMICAL VAPOR-DEPOSITION OF SINGLE-CRYSTALLINE ZNO FILM WITH SMOOTH SURFACE ON INTERMEDIATELY SPUTTERED ZNO THIN-FILM ON SAPPHIRE
OHNISHI, S
HIROKAWA, Y
SHIOSAKI, T
KAWABATA, A
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (05) : 773 - 778
[9] PREPARATION OF ZNO THIN-FILMS BY PLASMA-ENHANCED ORGANO-METALLIC CHEMICAL VAPOR-DEPOSITION
SHIMIZU, M
HORII, T
SHIOSAKI, T
KAWABATA, A
[J]. THIN SOLID FILMS, 1982, 96 (02) : 149 - 154
[10] GROWTH OF C-AXIS ORIENTED ZNO THIN-FILMS WITH HIGH DEPOSITION RATE ON SILICON BY CVD METHOD
SHIMIZU, M
SHIOSAKI, T
KAWABATA, A
[J]. JOURNAL OF CRYSTAL GROWTH, 1982, 57 (01) : 94 - 100