GROWTH OF C-AXIS ORIENTED ZNO THIN-FILMS WITH HIGH DEPOSITION RATE ON SILICON BY CVD METHOD

被引：35

作者：

SHIMIZU, M

SHIOSAKI, T

KAWABATA, A

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1982年 / 57卷 / 01期

关键词：

D O I：

10.1016/0022-0248(82)90253-6

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：94 / 100

页数：7

共 21 条

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