RF SPUTTER-DEPOSITED ALUMINUM-OXIDE FILMS AS HIGH-QUALITY ARTIFICIAL TUNNEL BARRIERS

被引:6
作者
BARNER, JB
RUGGIERO, ST
机构
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D O I
10.1109/TMAG.1987.1064989
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:854 / 858
页数:5
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