RECENT APPLICATIONS OF SECONDARY NEUTRAL MASS-SPECTROMETRY FOR QUANTITATIVE-ANALYSIS OF HOMOGENEOUS AND STRUCTURED SAMPLES

被引：44

作者：

OECHSNER, H

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1988年 / 33卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(88)90710-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：918 / 925

页数：8

相关论文

共 26 条

[1] STOICHIOMETRY EFFECTS AT NIMO SURFACES UNDER BOMBARDMENT WITH AR+ IONS FROM 40 TO 2000 EV
BARTELLA, J
OECHSNER, H
[J]. SURFACE SCIENCE, 1983, 126 (1-3) : 581 - 588
[2] DEVELOPMENTS IN SECONDARY ION MASS-SPECTROSCOPY AND APPLICATIONS TO SURFACE STUDIES
BENNINGHOVEN, A
[J]. SURFACE SCIENCE, 1975, 53 (DEC) : 596 - 625
[3] Benninghoven A., 1987, SECONDARY ION MASS S
[4] UNTERSUCHUNGEN ZUR EMISSION POSITIVER SEKUNDARIONEN AUS FESTEN TARGETS . DIE BRAUCHBARKEIT DER IONENBESCHUSS-IONENQUELLE IN DER MASSENSPEKTROSKOPIE
BESKE, HE
[J]. ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1967, A 22 (04): : 459 - +
[5] SPUTTERING STUDIES WITH THE MONTE-CARLO PROGRAM TRIM.SP
BIERSACK, JP
ECKSTEIN, W
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 34 (02): : 73 - 94
[6] MASS-SPECTROMETRIC STUDY OF SPUTTERING OF KB BY LOW-ENERGY AR+ AND XE+ IONS
CAMPBELL, AB
COOPER, CB
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) : 863 - &
[7] GEIGER JF, 1987, P IPAT 87, P390
[8] ANALYSIS OF SOLIDS BY SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY
GNASER, H
FLEISCHHAUER, J
HOFER, WO
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04): : 211 - 220
[9] HALDEN T, 1984, THESIS U KAISERSLAUT
[10] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY
HONIG, RE
[J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) : 549 - 555