ELECTRON-BEAM AND X-RAY RESIST BEHAVIOR OF POLY(METHACRYLONITRILE)

被引：13

作者：

HELBERT, JN ^{[1
]}

COOK, CF ^{[1
]}

CHEN, CY ^{[1
]}

PITTMAN, CU ^{[1
]}

机构：

[1] UNIV ALABAMA,DEPT CHEM,UNIVERSITY,AL 35486

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 04期

关键词：

electron-beam lithography; polymer degradation; resists; vinyl polymers;

D O I：

10.1149/1.2129112

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：694 / 696

页数：3

共 14 条

[1]

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[2]

HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337

[3] POLY(METHYL-ALPHA-CHLORACRYLATE) AS A NEW POSITIVE ELECTRON-BEAM RESIST [J].

HELBERT, JN ;

COOK, CF ;

POINDEXTER, EH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) :158-159

[4] DIFFERENTIAL DISSOLUTION AND ELECTRON-BEAM LITHOGRAPHIC SENSITIVITY OF POLY(METHYL METHACRYLATE) [J].

HELBERT, JN ;

COOK, CF ;

POINDEXTER, EH ;

WAGNER, BE .

POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) :414-419

[5]

HELBERT JN, 1977, POLYM PREPR, V18, P772

[6]

HELBERT JN, 1978, J POLYM SCI

[7]

HUGHES GP, 1977, SOLID STATE TECHNOL, V20, P39

[8] STUDY ON DISSOLUTION RATE OF IRRADIATED POLY(METHYL METHACRYLATE) [J].

OUANO, AC .

POLYMER ENGINEERING AND SCIENCE, 1978, 18 (04) :306-313

[9] IONIC POLYMERIZATION .13. POLYMERIZATION OF METHACRYLONITRILE WITH LITHIUM IN AMMONIA [J].

OVERBERGER, CG ;

PEARCE, EM ;

MAYES, N .

JOURNAL OF POLYMER SCIENCE, 1959, 34 (127) :109-120

[10]

STILLWAGON LE, 1977, COAT PLASTICS PREPR, V37, P38

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