IMAGING CHARACTERISTICS OF MULTIPHASE-SHIFTING AND HALF-TONE PHASE-SHIFTING MASKS

被引：82

作者：

TERASAWA, T

HASEGAWA, N

FUKUDA, H

KATAGIRI, S

机构：

[1] Central Research Laboratory, Hitachi, Ltd, Kokubunji, Tokyo, 185

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

PHASE-SHIFTING MASK; RESOLUTION; OPTICAL LITHOGRAPHY; CRITICAL FREQUENCY; FOCUS LATITUDE; HALF-TONE I-LINE; EXCIMER LASER;

D O I：

10.1143/JJAP.30.2991

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Phase-shifting masks and imaging characteristics are discussed and compared with those of conventional transmission masks. Then, new phase-shifting masks with intermediate values of phase shifting or transmittance are proposed, and their imaging characteristics are investigated. A phase-shifting mask with a 90-degrees phase difference can ease the restrictions on pattern geometries used in phase-shifting technology but does not increase the focus latitude. It is also suggested that a halftone phase-shifting mask is suitable for printing isolated patterns and it gives wider focus latitude than conventional mask technology.

引用

页码：2991 / 2997

页数：7

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