ELECTRON-PHONON INTERACTION AT A SILICON SURFACE

被引：9

作者：

KELLY, MJ ^{[1
]}

HANKE, W ^{[1
]}

机构：

[1] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER

来源：

PHYSICAL REVIEW B | 1981年 / 23卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.23.924

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：924 / 927

页数：4

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